Design and practical aspects of the most advanced state of micro- and nano-electronics processing with emphasis on thin film deposition, substrate passivation, lithography and etching with thermodynamics, kinetics, reactor design, and optimization. Course Information: Same as MENG 413. 3 undergraduate hours. 4 graduate hours. Extensive computer use required. Prerequisite(s): Graduate standing or consent of the instructor. Recommended background: Engineering/Science.