IPĀ 445. Patent Law: Statutory and Regulatory Fundamentals. 2 hours.
Tracks a patent application for an invention from conception through the U.S. Patent and Trademark Office. Course Information: Same as JD 445. Previously listed as JD 199. Prerequisite(s): JD 401, and JD 405, and JD 406, and JD 407, and JD 411, and JD 414, and JD 415, and JD 416; and LAW 402 or LAW 403 or LAW 404; and LAW 412 or LAW 413.